DocumentCode :
525906
Title :
Numerical simulation of metal interconnects of power semiconductor devices
Author :
Ershov, Maxim ; Tcherniaev, Andrew ; Feinberg, Yuri ; Lindorfer, Philipp ; French, William ; Hopper, Peter
Author_Institution :
Silicon Frontline Technol., Campbell, CA, USA
fYear :
2010
fDate :
6-10 June 2010
Firstpage :
185
Lastpage :
188
Abstract :
This paper presents a methodology and a software tool - R3D - for extraction, simulations, analysis, and optimization of metal interconnects of power semiconductor devices. This tool allows an automated calculation of large area device Rdson value, to analyze current density and potential distributions, to design sense device, and to optimize a layout to achieve a balanced and optimal design. R3D helps to reduce the probability of a layout error, and drastically speeds up and improves the quality of layout design.
Keywords :
circuit layout; circuit simulation; current density; interconnections; numerical analysis; power semiconductor devices; software tools; R3D software tool; current density analysis; large area device Rdson value; layout design quality; layout error probability; metal interconnect simulation; numerical simulation; power semiconductor devices; Analytical models; Bonding; Circuit simulation; Current density; Electrical resistance measurement; Length measurement; Numerical simulation; Power semiconductor devices; Software tools; Wire;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location :
Hiroshima
ISSN :
1943-653X
Print_ISBN :
978-1-4244-7718-0
Electronic_ISBN :
1943-653X
Type :
conf
Filename :
5544002
Link To Document :
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