• DocumentCode
    525906
  • Title

    Numerical simulation of metal interconnects of power semiconductor devices

  • Author

    Ershov, Maxim ; Tcherniaev, Andrew ; Feinberg, Yuri ; Lindorfer, Philipp ; French, William ; Hopper, Peter

  • Author_Institution
    Silicon Frontline Technol., Campbell, CA, USA
  • fYear
    2010
  • fDate
    6-10 June 2010
  • Firstpage
    185
  • Lastpage
    188
  • Abstract
    This paper presents a methodology and a software tool - R3D - for extraction, simulations, analysis, and optimization of metal interconnects of power semiconductor devices. This tool allows an automated calculation of large area device Rdson value, to analyze current density and potential distributions, to design sense device, and to optimize a layout to achieve a balanced and optimal design. R3D helps to reduce the probability of a layout error, and drastically speeds up and improves the quality of layout design.
  • Keywords
    circuit layout; circuit simulation; current density; interconnections; numerical analysis; power semiconductor devices; software tools; R3D software tool; current density analysis; large area device Rdson value; layout design quality; layout error probability; metal interconnect simulation; numerical simulation; power semiconductor devices; Analytical models; Bonding; Circuit simulation; Current density; Electrical resistance measurement; Length measurement; Numerical simulation; Power semiconductor devices; Software tools; Wire;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
  • Conference_Location
    Hiroshima
  • ISSN
    1943-653X
  • Print_ISBN
    978-1-4244-7718-0
  • Electronic_ISBN
    1943-653X
  • Type

    conf

  • Filename
    5544002