DocumentCode :
526042
Title :
Saturation current improvement in 1200 V normally-off SiC VJFETs using non-uniform channel doping
Author :
Ritenour, A. ; Sheridan, D.C. ; Bondarenko, V. ; Casady, J.B.
Author_Institution :
SemiSouth Labs., Inc., Starkville, MS, USA
fYear :
2010
fDate :
6-10 June 2010
Firstpage :
361
Lastpage :
364
Abstract :
Excellent performance and record inverter efficiency have been reported for 1200 V normally-off silicon carbide (SiC) vertical channel junction field effect transistors (VJFETs) with uniform channel doping. Optimally designed normally-off SiC VJFETs typically have a threshold voltage of approximately +1 V and pentode-like output characteristics with clear saturation. Some applications require significant surge or pulsed current capability thus it is desirable to increase saturation current density while maintaining normally-off operation. This paper reports the use of non-uniform channel doping in a normally-off SiC power VJFET to achieve a 28-48% increase in saturation current and 13% decrease in on-resistance compared to the uniform channel case. This results in a specific on-resistance of 2.5 mΩ·cm2 and saturation current density of 1275 A·cm-2 at 25°C. Forward drain leakage at Vgs= 0 V and Vds= 1100 V (measurement setup limit) is very similar for both channel doping profiles and remains less than 55 uA (1.75 mA·cm-2) at 150°C for the non-uniform channel SiC VJFET. The total switching energy for non-uniform channel devices was 194 μJ compared to 190 μJ for uniform channel devices.
Keywords :
junction gate field effect transistors; semiconductor doping; silicon compounds; SiC; energy 194 muJ; non-uniform channel doping; normally-off VJFET; pulsed current capability; saturation current improvement; surge current capability; temperature 150 degC; temperature 25 degC; vertical channel junction field effect transistors; voltage 1100 V; Bonding; Current density; Doping profiles; Inverters; Laboratories; Power semiconductor devices; Semiconductor device doping; Silicon carbide; Surges; Threshold voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Power Semiconductor Devices & IC's (ISPSD), 2010 22nd International Symposium on
Conference_Location :
Hiroshima
ISSN :
1943-653X
Print_ISBN :
978-1-4244-7718-0
Electronic_ISBN :
1943-653X
Type :
conf
Filename :
5544722
Link To Document :
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