Title :
Lateral Drift-Field Photodetector for high speed 0.35µm CMOS imaging sensors based on non-uniform lateral doping profile: Design, theoretical concepts, and TCAD simulations
Author :
Mahdi, Rana ; Fink, Johannes ; Hosticka, Bedrich J.
Author_Institution :
Dept. of Opt. Sensor Syst., Fraunhofer Inst. for Microelectron. Circuits & Syst. (IMS), Duisburg, Germany
Abstract :
A novel photodetector concept for high charge transfer speed and low image lag is presented. The key feature of the so-called Lateral Drift-Field Photodetector (LDPD) is a lateral electric drift field inside the photoactive area of the device. This results in a significant acceleration of the charge collection compared to conventional diffusion based detectors and, therefore, this device is an ideal candidate for high speed applications like 3D Time-of-Flight imaging. Furthermore, the LDPD concept shows a superior noise performance as the charge collection node is decoupled from the readout node. The LDPD device was developed in a standard 0.35μm CMOS process with only one additional mask step being necessary in order to implement the lateral doping gradient.
Keywords :
CMOS image sensors; doping profiles; photodetectors; high speed CMOS imaging sensor; lateral drift-field photodetector; lateral electric drift field; low image lag; nonuniform lateral doping profile; photoactive area; size 0.35 mum; CMOS integrated circuits; Electric potential; Electrostatics; Imaging; Logic gates; Photodetectors; Pixel; Buried-MOS capacitor Collection Gate (CG); Charge transfer; Floating Diffusion (FD); High-Speed CMOS Imaging Sensor; Large Pixel; Lateral Drift-Field Photodetector (LDPD); Low noise; Time of Flight (ToF); Transfer Gate (TG); component;
Conference_Titel :
Ph.D. Research in Microelectronics and Electronics (PRIME), 2010 Conference on
Conference_Location :
Berlin
Print_ISBN :
978-1-4244-7905-4