DocumentCode :
528002
Title :
The effect of Gamma-Ray dosage on the fabrication of lithium niobate ridge structures
Author :
Chang, Chia-Hao ; Wei, Yuan-Yaw ; Wang, Way-Seen
Author_Institution :
Grad. Inst. of Electron. Eng., Nat. Taiwan Univ., Taipei, Taiwan
fYear :
2010
fDate :
5-9 July 2010
Firstpage :
234
Lastpage :
235
Abstract :
Ridge structures are fabricated on lithium niobate substrates with gamma-ray irradiation of various dosages. Experimental results show the maximum depth and aspect-ratio can be obtained when the dosages are 163 and 325 krad, respectively.
Keywords :
gamma-ray effects; lithium compounds; optical modulation; ridge waveguides; gamma-ray dosage; gamma-ray irradiation; lithium niobate ridge structure fabrication; Lithium niobate; Optical device fabrication; Optical waveguides; Protons; Radiation effects; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
OptoElectronics and Communications Conference (OECC), 2010 15th
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-6785-3
Type :
conf
Filename :
5587933
Link To Document :
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