DocumentCode :
528270
Title :
Low-crosstalk offset crossing waveguide fabricated on SOI substrates
Author :
Tanaka, D. ; Shoji, Y. ; Kintaka, K. ; Kawashima, H. ; Ikuma, Y. ; Tsuda, H.
Author_Institution :
Keio Univ., Yokohama, Japan
fYear :
2010
fDate :
5-9 July 2010
Firstpage :
870
Lastpage :
871
Abstract :
The offset crossing waveguide was proposed and fabricated on silicon-on-insulator (SOI) substrates. We successfully achieved the low-crosstalk offset crossing waveguide which had a crosstalk of less than -50 dB.
Keywords :
optical fabrication; optical waveguides; silicon-on-insulator; SOI substrate; low crosstalk offset crossing waveguide; silicon-on-insulator substrate; Crosstalk; Optical crosstalk; Optical device fabrication; Optical waveguides; Photonics; Propagation losses; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
OptoElectronics and Communications Conference (OECC), 2010 15th
Conference_Location :
Sapporo
Print_ISBN :
978-1-4244-6785-3
Type :
conf
Filename :
5588454
Link To Document :
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