Parameter variation and sensitivity analysis of a two-stage Miller amplifier

Electronics submicrometrics devices present large systematic parameter variations related to imperfections during the fabrication process. These variations impact directly on the analog design, causing low reliability and increasing costs. This work presents a sensitivity analysis of parameter variation for a typical CMOS two-stage Miller operational transconductance amplifier, analyzing the main points of sensitivity related to changes in nominal values of VTO, TOX and geometric parameters. Simulations are presented in order to demonstrate the impact of the process variations over circuit specifications.