Title :
On the speckle pattern interferometry analysis of instrument errors
Author :
Yanping, Huang ; Tongyu, Wang ; Sheng Jingqi ; Dongmei, Van ; Hongji, Xu ; Wenpeng, Li
Author_Institution :
Dept. of Mech. Coll., Changchun Univ. of Sci. & Technol., Changchun, China
Abstract :
Photoelectron interference speckle class precision equipment by many factors, often below standard detection accuracy This paper will mainly measurement error are discussed. Summarizes the error detection system consists of two parts, namely, system error and random error. In this paper the causes that produce these errors were analyzed, Clearly the accuracy of the detection system and a number of parameters. More accurately calculate the size of the various error, clear all errors on the measurement of the degree Proposed to reduce and eliminate these errors specific measures. This type of equipment to improve manufacturing precision, and the proper use of such equipment with some guidance.
Keywords :
electronic speckle pattern interferometry; error analysis; light interference; measurement errors; instrument errors; measurement error; photoelectron interference speckle; random error; speckle pattern interferometry; system error; Accuracy; Charge coupled devices; Indexes; Measurement by laser beam; Measurement uncertainty; Vibration measurement; Wavelength measurement; Interference device; error research;
Conference_Titel :
Computer, Mechatronics, Control and Electronic Engineering (CMCE), 2010 International Conference on
Conference_Location :
Changchun
Print_ISBN :
978-1-4244-7957-3
DOI :
10.1109/CMCE.2010.5609621
