• DocumentCode
    530965
  • Title

    RF passive components on a low resistivity Si substrate with an ABF isolation layer

  • Author

    Kim, Dongsu ; Kim, Dong Ho ; Yook, Jong Min ; Ryu, Jong In ; Park, Se-Hoon ; Kim, Jun Chul

  • Author_Institution
    Packaging Res. Centre, Korea Electron. Technol. Inst., Seongnam, South Korea
  • fYear
    2010
  • fDate
    27-28 Sept. 2010
  • Firstpage
    317
  • Lastpage
    320
  • Abstract
    This paper presents an implementation of RF passive components on a low resistivity Si substrate with a thick ajinomoto build-up film (ABF) to reduce electromagnetic field interaction with the Si substrate. The comparison of three coplanar waveguides (CPWs) on different Si substrates has been performed to provide feasibility of ABF-layer approach. After that, a bandpass filter and baluns have been fabricated on the low resistivity Si substrate with a 40-μm and/or an 80-μm ABF as an isolation layer. A 3-μm SU-8 layer has been spun on the ABF layer to form insulator for Metal Insulator Metal (MIM) capacitors. The implemented bandpass filter and balun based on a 40-μm ABF isolation layer provide a relatively low in-band insertion loss. In order to further improve the overall performance, two 40-μm ABF layers on the low resistivity Si substrate have been used, resulting in more than 0.8-dB insertion loss improvement at the balun.
  • Keywords
    MIM devices; baluns; band-pass filters; capacitors; coplanar waveguides; isolation technology; passive networks; ABF isolation layer; CPW; MIM capacitors; RF passive components; ajinomoto build-up film; baluns; bandpass filter; coplanar waveguides; electromagnetic field interaction; in-band insertion loss; insertion loss improvement; low resistivity substrate; metal insulator metal capacitors; size 40 mum; size 80 mum; Frequency measurement; Impedance matching; Inductors; Insertion loss; Radio frequency; Silicon; Substrates;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Integrated Circuits Conference (EuMIC), 2010 European
  • Conference_Location
    Paris
  • Print_ISBN
    978-1-4244-7231-4
  • Type

    conf

  • Filename
    5613755