DocumentCode :
531419
Title :
Balanced BPFs implemented using IPD (integrated passive devices) technology
Author :
Yook, Jong-Min ; Yu, Je-In ; Park, Jong-Chul ; Kwon, Young-Se
Author_Institution :
Packaging Res. Center, Korea Electron. Technol. Inst. (KETI), Seongnam, South Korea
fYear :
2010
fDate :
28-30 Sept. 2010
Firstpage :
429
Lastpage :
432
Abstract :
Perfectly balanced BPFs are realized in this paper through IPD technology. To create a symmetric structure, two three-stage coupled BPFs are combined. The resonators of the filter are made with mircostrip-line inductors and MIM capacitors. SAAO (Selectively Anodized Aluminum Oxide) and HRS (High Resistivity Silicon) substrates are used to make the filters. All of the fabricated balanced BPFs have a maximum in-band PI (Phase Imbalance) within 0.5° The maximum in-band MD (Magnitude Difference) is less than 0.25 dB. The fabricated filters are very small, at 1.5 × 1.36 mm2 (SAAO) and 1.38 × 1.28 mm2 (HRS), and their IL (Insertion Loss) values are 2.57 dB and 1.95 dB at 2.45 GHz, respectively.
Keywords :
aluminium compounds; microstrip lines; passive filters; resonator filters; AlO; HRS; IPD technology; MIM capacitors; SAAO; Si; balanced BPF; fabricated filters; frequency 2.45 GHz; high resistivity silicon substrates; integrated passive devices technology; magnitude difference; mircostrip-line inductors; phase imbalance; resonators; selectively anodized aluminum oxide; symmetric structure; Anodized Aluminum Oxide; Balanced BPF; Coupled Resonator Filter; IPD; Integrated Passive Devices;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (EuMC), 2010 European
Conference_Location :
Paris
Print_ISBN :
978-1-4244-7232-1
Type :
conf
Filename :
5616249
Link To Document :
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