Title :
Evidence of successive Fowler-Nordheim and Frenkel-Poole conductions in Si3N4 based RF-MEMS capacitive switches
Author :
Mardivirin, David ; Courrèges, Stanis ; Crunteanu, Aurelian ; Pothier, Arnaud ; Blondy, Pierre ; Coccetti, Fabio ; Plana, Robert
Author_Institution :
CNRS, Univ. de Limoges, Albert Thomas, France
Abstract :
We studied the dielectric charging in RF-MEMS based on Si3N4 dielectric layers, deposited by PECVD. The component is a 79 fF to 646 fF capacitive switch made with two series fixed and MEMS capacitors. Charging is investigated and modeled in order to extract the specific conduction laws. We used a two time constants charging model, which can be identified as successive Fowler-Nordheim and Frenkel-Poole conductions occuring in RF-MEMS devices.
Keywords :
Poole-Frenkel effect; capacitor switching; dielectric thin films; microswitches; plasma CVD coatings; semiconductor device models; silicon compounds; Fowler-Nordheim conduction; Frenkel-Poole conduction; MEMS capacitors; PECVD; RF-MEMS capacitive switches; Si3N4; conduction laws; dielectric charging; dielectric layers; plasma enhanced chemical vapor deposition; radiofrequency microelectromechanical systems; series fixed capacitors; time constants charging model;
Conference_Titel :
Microwave Conference (EuMC), 2010 European
Conference_Location :
Paris
Print_ISBN :
978-1-4244-7232-1
