Title :
Simulation on nanoimprint of grating structures
Author :
Sun, Hongwen ; Liu, Guogao ; Lin, Shanming
Author_Institution :
Coll. of Comput. & Inf. Eng., Hohai Univ., Changzhou, China
Abstract :
Nanoimprint lithography (NIL) is an important nanolithography process with low cost, high throughput and high resolution. It creates patterns by mechanical deformation of imprint resist. Fabricating gratings by NIL can manufacture lots of replica in a fast way. Simulation on the NIL process has a vital role on choosing optimized parameters. One finite element analysis software DEFORM was used to analyze different imprint factors. Through simulation optimization, it was found that imprint temperature, pressure and time strongly affected the replication fidelity. The simulation result will guide the NIL experiment.
Keywords :
deformation; diffraction gratings; finite element analysis; nanolithography; optical fabrication; resists; soft lithography; NIL; finite element analysis; gratings; mechanical deformation; nanoimprint lithography; nanolithography; replication fidelity; resist; Analytical models; Computational modeling; Deformable models; Gratings; Nanolithography; Polymers; Resists; Simulation Optimization; grating; micro/nanostructures; nanoimprint; replication;
Conference_Titel :
Computer Application and System Modeling (ICCASM), 2010 International Conference on
Conference_Location :
Taiyuan
Print_ISBN :
978-1-4244-7235-2
Electronic_ISBN :
978-1-4244-7237-6
DOI :
10.1109/ICCASM.2010.5622281
