DocumentCode
533700
Title
Electronic properties of WO3 quantum films
Author
Migas, B.D. ; Shaposhnikov, L.V.
Author_Institution
Inf. & Radioelectron., Belarusian State Univ., Minsk, Belarus
fYear
2010
fDate
13-17 Sept. 2010
Firstpage
809
Lastpage
810
Abstract
By ab initio calculations we show that quantum confinement effects do not affect the energy band gap in the quantum films of WO3 thicker than 1.5 nm. We have also revealed that states of the surface atoms stabilize the band-gap edges.
Keywords
ab initio calculations; energy gap; semiconductor thin films; surface states; tungsten compounds; WO3 quantum films; WO3; ab initio calculations; band-gap edges; electronic properties; energy band gap; quantum confinement effects; surface atom states; Computational modeling; Films; Nanowires; Photonic band gap; Silicon; Surface morphology; Surface reconstruction;
fLanguage
English
Publisher
ieee
Conference_Titel
Microwave and Telecommunication Technology (CriMiCo), 2010 20th International Crimean Conference
Conference_Location
Sevastopol
Print_ISBN
978-1-4244-7184-3
Type
conf
DOI
10.1109/CRMICO.2010.5632427
Filename
5632427
Link To Document