DocumentCode :
535757
Title :
DIffractive Microlenses With binary focal points on the optical axis
Author :
Mihailescu, M. ; Sobetkii, A. ; Pelteacu, M.
Author_Institution :
Politeh. Univ. from Bucharest, Bucharest, Romania
Volume :
01
fYear :
2010
fDate :
11-13 Oct. 2010
Firstpage :
113
Lastpage :
116
Abstract :
The aim of our study was to find a simple design for diffractive microlenses (DMLs) which will generate two focal points on the propagation axis at plane wave incidence. We investigate the influence of the missing central zones in the diffraction pattern. The fabrication steps include e-beam lithography (for mask pattern) and reactive ion etching (for transparent DMLs). To visualize their transparent binary microrelief and the phase profile, we employ the digital holographic microscopy technique. Experimental and simulation results are presented.
Keywords :
diffractive optical elements; electron beam lithography; holography; light propagation; masks; microlenses; optical design techniques; optical fabrication; sputter etching; surface topography; transparency; binary focal points; central zones; diffractive microlenses; digital holographic microscopy; e-beam lithography; mask pattern; optical axis; phase profile; plane wave incidence; propagation axis; reactive ion etching; transparent binary microrelief; Holographic optical components; Holography; Lenses; Microoptics; Optical device fabrication; Optical diffraction; Optical refraction; Diffractive microlenses; Fresnel approximation; digital holographic microscopy;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Conference (CAS), 2010 International
Conference_Location :
Sinaia
ISSN :
1545-827X
Print_ISBN :
978-1-4244-5783-0
Type :
conf
DOI :
10.1109/SMICND.2010.5650237
Filename :
5650237
Link To Document :
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