DocumentCode :
53631
Title :
Theoretical Analysis of Dielectric Modulated Drift Region for Si Power Devices
Author :
Jiuyang Zhou ; Chih-Fang Huang ; Yen-Hsin Chen
Author_Institution :
Inst. of Electron. Eng., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Volume :
36
Issue :
4
fYear :
2015
fDate :
Apr-15
Firstpage :
378
Lastpage :
380
Abstract :
This letter presents a theoretical analysis of the dielectric modulated drift region in Si power devices. By inserting multiple dielectric columns in the drift region the tradeoff between the breakdown voltage (BV) and the specific ON-resistance (RON,sp) can be significantly improved. An analytical model for the electric field distribution and breakdown voltage of this structure is derived and a methodology is proposed for identifying the optimal BV-RON,sp tradeoff. The 2-D numerical simulations are conducted to verify the accuracy of the proposed model.
Keywords :
dielectric materials; electric breakdown; elemental semiconductors; power semiconductor devices; silicon; Si; breakdown voltage; dielectric column; dielectric modulated drift region; electric field distribution; silicon power device; specific on-resistance; theoretical analysis; Analytical models; Dielectrics; Electric fields; Numerical models; Object recognition; Schottky diodes; Silicon; Analytical modeling; dielectric; power device; silicon;
fLanguage :
English
Journal_Title :
Electron Device Letters, IEEE
Publisher :
ieee
ISSN :
0741-3106
Type :
jour
DOI :
10.1109/LED.2015.2400457
Filename :
7031857
Link To Document :
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