DocumentCode
53763
Title
Design and Analysis of Copper and Aluminum Interconnects for All-Spin Logic
Author
Sou-Chi Chang ; Iraei, Rouhollah M. ; Manipatruni, Sasikanth ; Nikonov, Dmitri E. ; Young, Ian A. ; Naeemi, Azad
Author_Institution
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume
61
Issue
8
fYear
2014
fDate
Aug. 2014
Firstpage
2905
Lastpage
2911
Abstract
In this paper, a conventional spin-valve configuration combined with spin-torque-driven switching is used as an energy efficient interconnect structure for all-spin logic. Both Cu and Al interconnect materials are analyzed based on physical models for spin injection, spin transport, and magnetization dynamics. The results indicate proposed metallic interconnects dissipate less energy as compared with all-spin logic interconnects based on the nonlocal spin-valve configuration. Compared with a similar spin interconnect with an Si channel, the spin currents and injection efficiencies are predicted to be higher when a metal like Cu or Al is used due to no Schottky barrier at the interface. Because of the longer spin relaxation length (SRL) in Al as compared with Cu, the delay and energy dissipation are lower when Al is used especially at longer lengths where signal loss becomes important. While metallic spin interconnects are faster and more energy efficient in short lengths because of their smaller resistances and higher spin injection efficiencies, they are outperformed by spin interconnects with Si channels at long lengths because the SRLs in Si can be as long as many micrometers, whereas in metals they are limited to a few hundred nanometers.
Keywords
aluminium; copper; integrated circuit interconnections; logic circuits; logic design; silicon; SRL; all-spin logic interconnect; aluminum interconnect material; conventional spin-valve configuration; copper interconnect material; energy dissipation; energy-efficient interconnect structure; magnetization dynamics; metallic spin interconnect; nonlocal spin-valve configuration; physical model; signal loss; silicon channel; spin current; spin injection efficiency; spin relaxation length; spin transport; spin-torque-driven switching; Delays; Integrated circuit interconnections; Metals; Silicon; Spin polarized transport; Tunneling; All-spin logic (ASL); interconnects; nonequilibrium Greens function (NEGF); spin-transfer torque; spin-transfer torque.;
fLanguage
English
Journal_Title
Electron Devices, IEEE Transactions on
Publisher
ieee
ISSN
0018-9383
Type
jour
DOI
10.1109/TED.2014.2327057
Filename
6834821
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