DocumentCode :
53763
Title :
Design and Analysis of Copper and Aluminum Interconnects for All-Spin Logic
Author :
Sou-Chi Chang ; Iraei, Rouhollah M. ; Manipatruni, Sasikanth ; Nikonov, Dmitri E. ; Young, Ian A. ; Naeemi, Azad
Author_Institution :
Sch. of Electr. & Comput. Eng., Georgia Inst. of Technol., Atlanta, GA, USA
Volume :
61
Issue :
8
fYear :
2014
fDate :
Aug. 2014
Firstpage :
2905
Lastpage :
2911
Abstract :
In this paper, a conventional spin-valve configuration combined with spin-torque-driven switching is used as an energy efficient interconnect structure for all-spin logic. Both Cu and Al interconnect materials are analyzed based on physical models for spin injection, spin transport, and magnetization dynamics. The results indicate proposed metallic interconnects dissipate less energy as compared with all-spin logic interconnects based on the nonlocal spin-valve configuration. Compared with a similar spin interconnect with an Si channel, the spin currents and injection efficiencies are predicted to be higher when a metal like Cu or Al is used due to no Schottky barrier at the interface. Because of the longer spin relaxation length (SRL) in Al as compared with Cu, the delay and energy dissipation are lower when Al is used especially at longer lengths where signal loss becomes important. While metallic spin interconnects are faster and more energy efficient in short lengths because of their smaller resistances and higher spin injection efficiencies, they are outperformed by spin interconnects with Si channels at long lengths because the SRLs in Si can be as long as many micrometers, whereas in metals they are limited to a few hundred nanometers.
Keywords :
aluminium; copper; integrated circuit interconnections; logic circuits; logic design; silicon; SRL; all-spin logic interconnect; aluminum interconnect material; conventional spin-valve configuration; copper interconnect material; energy dissipation; energy-efficient interconnect structure; magnetization dynamics; metallic spin interconnect; nonlocal spin-valve configuration; physical model; signal loss; silicon channel; spin current; spin injection efficiency; spin relaxation length; spin transport; spin-torque-driven switching; Delays; Integrated circuit interconnections; Metals; Silicon; Spin polarized transport; Tunneling; All-spin logic (ASL); interconnects; nonequilibrium Greens function (NEGF); spin-transfer torque; spin-transfer torque.;
fLanguage :
English
Journal_Title :
Electron Devices, IEEE Transactions on
Publisher :
ieee
ISSN :
0018-9383
Type :
jour
DOI :
10.1109/TED.2014.2327057
Filename :
6834821
Link To Document :
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