DocumentCode :
538377
Title :
Novel soft lithography technique for fabrication of Ni nanodots for use as bit patterned media
Author :
Ramaswamy, S. ; Ganesh, K.R. ; Gopalakrishnan, C.
Author_Institution :
Nanotechnol. Res. Center, SRM Univ., Chennai, India
fYear :
2010
fDate :
10-12 Nov. 2010
Firstpage :
1
Lastpage :
2
Abstract :
Magnetic disk drive technology has successfully reduced the size of multi-grain bits to ~30 nm, and there are intensive industrial efforts to shrink the bit size further. This work reports the development of a cheap, scalable polymer template lithography technique of fabricating large arrays of magnetic nanostructures towards use as bit patterned media, one of the prominent next generation data storage technologies. The technique has been standardized and physical properties such as bit sizes, pitch sizes and the storage densities have been calculated. Critical magnetic properties such as magnetization reversal have also been studied and discussed to ascertain the plausibility of its use in futuristic high density magnetic data storage devices.
Keywords :
magnetic disc storage; magnetisation; nanofabrication; nanostructured materials; nickel; polymers; soft lithography; Ni nanodot fabrication; bit patterned media; bit sizes; magnetic data storage device; magnetic disk drive technology; magnetic nanostructure; magnetic properties; magnetization reversal; pitch sizes; scalable polymer template lithography; soft lithography; storage density; Lithography; Magnetization; Magnetoresistance; Temperature sensors; Bit patterned media; Ni nanodots; data storage; polymer template lithography;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
APMRC, 2010 Digest
Conference_Location :
Singapore
Print_ISBN :
978-1-4244-8103-3
Type :
conf
Filename :
5682267
Link To Document :
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