DocumentCode :
539361
Title :
Going green with on-site generated fluorine: Sustainable cleaning agent for CVD processes
Author :
Stockman, Paul ; Shuttleworth, Greg
Author_Institution :
Linde Electronics, 1575 Mountain Avenue, Murray Hill, NJ 07974, USA
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
355
Lastpage :
358
Abstract :
On-site generated fluorine meets the sustainability requirements for the future of CVD thin-film process chamber cleaning. Rigorous industry safety standards are maintained, GWP and total carbon footprint impacts are greatly reduced, and significant process improvements are available.
Keywords :
Cleaning; Gases; Hafnium; Plasmas; Production; Safety; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714878
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=539361
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