• DocumentCode
    539387
  • Title

    Method and system for determining optimal wafer sampling in real-time inline monitoring and experimental design

  • Author

    Sun, Susan ; Johnson, Kari

  • Author_Institution
    Micron Technology Inc, Manassas, VA 20110, USA
  • fYear
    2008
  • fDate
    27-29 Oct. 2008
  • Firstpage
    44
  • Lastpage
    47
  • Abstract
    This paper describes a method and system based on weighted objectives to determine optimal wafer sampling for maximum coverage of the various process scenarios combined with coverage of each treatment of a designed experiment. It also uses a scalable technique to ensure global optimization instead of local optimization.
  • Keywords
    Algorithm design and analysis; Indexes; Manufacturing; Monitoring; Optimization; Presses;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM), 2008 International Symposium on
  • Conference_Location
    Tokyo, Japan
  • ISSN
    1523-553X
  • Electronic_ISBN
    1523-553X
  • Type

    conf

  • Filename
    5714908
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=539387