DocumentCode :
539387
Title :
Method and system for determining optimal wafer sampling in real-time inline monitoring and experimental design
Author :
Sun, Susan ; Johnson, Kari
Author_Institution :
Micron Technology Inc, Manassas, VA 20110, USA
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
44
Lastpage :
47
Abstract :
This paper describes a method and system based on weighted objectives to determine optimal wafer sampling for maximum coverage of the various process scenarios combined with coverage of each treatment of a designed experiment. It also uses a scalable technique to ensure global optimization instead of local optimization.
Keywords :
Algorithm design and analysis; Indexes; Manufacturing; Monitoring; Optimization; Presses;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714908
Link To Document :
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