Title :
Centering value by using TSMRA prediction of CD process variation
Author :
Murashima, Shigenobu ; Mizuhara, Noriaki ; Nishimura, Susumu
Author_Institution :
NEC Semiconductors Kansai, Ltd, 9-1, Seiran 2-Chome, Otsu City, Shiga 520-8555, Japan
Abstract :
This paper presents the accurate control method of process parameters by TSMRA: time series analysis added multiple regression analysis. This method has been applied to gate CD process of microwave devices and the best yield has been achieved.
Keywords :
Correlation; Equations; Etching; Mathematical model; Process control; Time series analysis; Tuning;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
Electronic_ISBN :
1523-553X
