DocumentCode
539400
Title
BEOL parametric variation control with FDC data
Author
Matsuhashi, Hideki ; Bai, Jenny ; Xie, Weldom ; Fernandez, Patrick ; Ngo, Luong ; Huron, Gilles ; Herndon, Michael ; Besnard, Jerome ; Williamson, Mike ; Graves, Spencer ; Akiya, Nobuchika ; Yu, Michael ; Jensen, Jim
Author_Institution
PDF Solutions, Inc., 333 West San Carlos Street, Suite 700, San Jose, CA, 95110, U.S.A.
fYear
2008
fDate
27-29 Oct. 2008
Firstpage
291
Lastpage
293
Abstract
Parametric variation control was simulated using key FDC sensors identified through multivariate modeling of Back End Of Line (BEOL) process equipment in a 65nm mass production line. The simulation results suggest potential opportunities for reducing parametric variation which can reduce parametric yield loss. This methodology is enabled by a centralized data management infrastructure that consolidates disjointed FDC sensor data into a single database.
Keywords
Copper; Databases; Predictive models; Radio frequency; Semiconductor device modeling; Temperature sensors;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location
Tokyo, Japan
ISSN
1523-553X
Electronic_ISBN
1523-553X
Type
conf
Filename
5714921
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