DocumentCode :
539415
Title :
Influence of deteriorated i-line filter on image quality of exposure tools, and its improvement
Author :
Okuyama, Kazunori
Author_Institution :
Fujitsu Microelectronics Limited 3, Kougyoudanchi, Monden-machi, Aizuwakamatsu-shi, Fukushima-ken, 965-8502, Japan
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
175
Lastpage :
176
Abstract :
We studied the influence of deterioration of i-line filter on image quality, and the method of replacing i-line filter to improve illuminance without influence on process conditions.
Keywords :
Image quality; Optical distortion; Optical filters; Optical imaging; Resists; Shape; Throughput;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714936
Link To Document :
https://search.ricest.ac.ir/dl/search/defaultta.aspx?DTC=49&DC=539415
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