DocumentCode :
539433
Title :
Detection of non visible Poly leakage defect by e-beam inspection
Author :
Ito, Shinya ; Matsushita, Yana ; Nagatani, Go
Author_Institution :
Spansion Japan Limited, Aizuwakamatsu-Shi, Fukushima, Japan
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
76
Lastpage :
78
Abstract :
E-beam inspection (EBI) was used on a Poly Voltage Contrast (PVC) structure to detect a non-visible Poly to Poly leakage defect on production wafers. The Voltage Contrast signature that EBI detected strongly correlated with electrical leakage test result. e-beam inspection on Poly Voltage Contrast structure significantly reduces the time for the defect root cause analysis.
Keywords :
Capacitors; Electric potential; Electron beams; Equivalent circuits; Inspection; Integrated circuit modeling; Production;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714955
Link To Document :
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