DocumentCode :
539437
Title :
Yield monitoring system for silicon wafer
Author :
Kogure, Mayumi ; Hirano, Yori ; Shindo, Wataru
Author_Institution :
Spansion Japan Limited, Aizuwakamatsu-Shi, Fukushima, Japan
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
398
Lastpage :
401
Abstract :
Wafer quality monitoring is getting more and more important for device makers because device/process margin against wafer quality variability get smaller and smaller as the technology shrinks. We developed a yield reporting system for wafer quality data monitoring. This system enables us to detect yield degradation caused by silicon wafer and also to improve yield by monitoring difference among wafer suppliers. Several use cases of detecting yield degradation and improving yield are described in this paper.
Keywords :
Annealing; Conductivity; Metals; Monitoring; Pollution measurement; Semiconductor device measurement; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714959
Link To Document :
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