DocumentCode :
539439
Title :
Qualification of inline FIB for production — A comprehensive “BEOL” contamination study
Author :
Sledz, Michael ; Baptiste, Burchell ; Pearl, Haim ; Porat, Ronnie ; Levin, Jacob
Author_Institution :
Spansion, 5204 East Ben White Blvd. 78741 Austin, TX USA
fYear :
2008
fDate :
27-29 Oct. 2008
Firstpage :
375
Lastpage :
378
Abstract :
In-line FIB (Focused Ion Beam) systems have become an important tool for failure analysis in the chip manufacturing production line. A general problem that in-line FIB users face is how to qualify returning wafers to production after FIB milling. In this paper we will present a set of experiments defined for qualifying in-line FIB production work in a 90nm generation FLASH production fab. The effect of FIB cuts on further process steps, cross tool contamination, the impact on yield and parametric testing were studied and will be discussed.
Keywords :
Contamination; Copper; Gallium; Manufacturing; Pollution measurement; Production; Testing;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
ISSN :
1523-553X
Electronic_ISBN :
1523-553X
Type :
conf
Filename :
5714961
Link To Document :
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