Title :
Qualification of inline FIB for production — A comprehensive “BEOL” contamination study
Author :
Sledz, Michael ; Baptiste, Burchell ; Pearl, Haim ; Porat, Ronnie ; Levin, Jacob
Author_Institution :
Spansion, 5204 East Ben White Blvd. 78741 Austin, TX USA
Abstract :
In-line FIB (Focused Ion Beam) systems have become an important tool for failure analysis in the chip manufacturing production line. A general problem that in-line FIB users face is how to qualify returning wafers to production after FIB milling. In this paper we will present a set of experiments defined for qualifying in-line FIB production work in a 90nm generation FLASH production fab. The effect of FIB cuts on further process steps, cross tool contamination, the impact on yield and parametric testing were studied and will be discussed.
Keywords :
Contamination; Copper; Gallium; Manufacturing; Pollution measurement; Production; Testing;
Conference_Titel :
Semiconductor Manufacturing (ISSM), 2008 International Symposium on
Conference_Location :
Tokyo, Japan
Electronic_ISBN :
1523-553X