A miniaturized transmission line with a mesh-structure signal metal for CMOS ICs

Author

Ono, Naoko ; Mitomo, Toshiya ; Hoshino, Hiroaki ; Watanabe, Osamu

Author_Institution

Wireless Syst. Lab., Toshiba Corp., Kawasaki, Japan

fYear

2010

fDate

7-10 Dec. 2010

Firstpage

598

Lastpage

601

Abstract

A transmission line, which has a mesh-structure signal metal, is presented in this work for standard CMOS processes. It is desirable for a transmission line in a CMOS IC to be small in size and have low insertion loss. We propose a novel transmission line with large phase constant so that the circuit element using the proposed line can be constructed with a small area. This paper explains the proposed transmission line structure using mesh-structure signal metal and presents experimental results. This paper also describes a suitable type of transmission line for millimeter-wave CMOS IC. With the proposed transmission line, the element size can be reduced by 8.2% compared with that of the conventional one.

Keywords

CMOS integrated circuits; millimetre wave integrated circuits; insertion loss; mesh-structure signal metal; millimeter-wave CMOS IC; miniaturized transmission line; phase constant; CMOS integrated circuits; CMOS process; Length measurement; Loss measurement; Metals; CMOS; coplanar waveguide; mesh-structure signal metal; millimeter-wave; transmission line;

fLanguage

English

Publisher

ieee

Conference_Titel

Microwave Conference Proceedings (APMC), 2010 Asia-Pacific

Conference_Location

Yokohama

Print_ISBN

978-1-4244-7590-2

Electronic_ISBN

978-1-902339-22-2

Type

conf

Filename

5728362