DocumentCode :
54100
Title :
GaN-Based High-Voltage Light-Emitting Diodes With SU-8 Passivation
Author :
Shuguang Li ; Kin-Tak Lam ; Wei-Chih Huang ; Shoou-Jinn Chang
Author_Institution :
Coll. of Sci., China Univ. of Pet. (East China), Qingdao, China
Volume :
11
Issue :
4
fYear :
2015
fDate :
Apr-15
Firstpage :
374
Lastpage :
377
Abstract :
The authors propose the use of SU-8 to passivate the isolation trenches of GaN-based high-voltage light-emitting diodes (HV-LEDs). Compared with the HV-LED chips prepared with pure SU-8 passivation, it was found that we could increase the production yield from ≤ 35% to ≥ 88% using properly diluted SU-8 passivation layer. It was also found that we could reduce the passivation layer thickness by diluting SU-8 with a ratio of 5:2. Furthermore, it was found that the properly diluted SU-8 could provide smooth surface, minimized crack formation, and thus larger production yield.
Keywords :
III-V semiconductors; cracks; gallium compounds; integrated optoelectronics; light emitting diodes; passivation; photoresists; wide band gap semiconductors; GaN; RV-LED; SU-8 passivation; high-voltage light emitting diodes; isolation trenches; minimized crack formation; passivation layer thickness; production yield; smooth surface; Educational institutions; Light emitting diodes; Passivation; Photonics; Production; Semiconductor device measurement; Voltage measurement; Crack; GaN; HV-LEDs; SU-8; production yield;
fLanguage :
English
Journal_Title :
Display Technology, Journal of
Publisher :
ieee
ISSN :
1551-319X
Type :
jour
DOI :
10.1109/JDT.2015.2401006
Filename :
7031901
Link To Document :
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