Title :
Capacitance/Conductance–Voltage–Frequency Characteristics of
Structures in Wide Frequency Range
Author :
Kaya, Ahmet ; Tecimer, Huseyin ; Vural, Ozkan ; Tasdemir, Ibrahim Hudai ; Altindal, S.
Author_Institution :
Dept. of Opticianry Vocational, Turgut Ozal Univ., Ankara, Turkey
Abstract :
The energy dependence of the interface states (Nss) and relaxation time (τ) and capture cross section (σp) of Nss in (Au/PVC+TCNQ/p-Si) heterojunction were investigated using high-low frequency capacitance (CHF-CLF) and conductance method, which contains many capacitance/conductance [C/(G/ω)-V] plots. The C value of the heterojunction increases with decreasing frequency as almost exponentially due to the existence of Nss between metal and semiconductor. The Nss and τ values have been obtained in the (0.053- Ev)-(0.785- Ev)-eV energy range by considering the voltage-dependent surface potential obtained from the lowest measurable frequency C-V curve at 1 kHz. The magnitude of Nss ranges from 3.88×1012 eV-1cm-2 to 3.24×1012 eV-1cm-2. In the same energy range, the value of τ ranges from 5.73×10-5 to 1.58×10-4 s and shows almost an exponential increase with increasing bias from the top of the valence band edge toward the midgap of semiconductor. The obtained Nss values from CHF-CLF and conductance methods are in good agreement with each other for the heterojunction. As a result, the mean value of Nss was found on the order of 1012 eV-1cm-2 and this value is very suitable for an electronic device.
Keywords :
carrier relaxation time; gold; interface states; organic semiconductors; silicon; valence bands; Au-PVC-TCNQ-p-Si structures; C-V curve; capacitance-conductance-voltage-frequency characteristics; capture cross section; conductance methods; electronic device; frequency 1 kHz; heterojunction; high-low frequency capacitance method; interface states; relaxation time; valence band; voltage-dependent surface potential; wide frequency range; Capacitance; Frequency measurement; Gold; Heterojunctions; Semiconductor device measurement; Silicon; Temperature measurement; Inorganic compounds; interface states; organic materials; semiconductor–metal interface;
Journal_Title :
Electron Devices, IEEE Transactions on
DOI :
10.1109/TED.2013.2296037