DocumentCode :
544158
Title :
Study of electromagnetic field stress impact on AlGaN/GaN HEMT transistor performances
Author :
Khémiri, S. ; Kadi, M. ; Louis, A. ; Mazari, B.
Author_Institution :
IRSEEM, ESIGELEC Technopole du Madrillet, St. Etienne du Rouvray, France
fYear :
2011
fDate :
14-16 March 2011
Firstpage :
1
Lastpage :
4
Abstract :
AlGaN/GaN HEMTs are tremendous interest in applications requiring high power at microwave frequencies. In the context of studying the reliability of RF High Power Amplifiers (HPA) in their real environment, a study of the effect of electromagnetic stress on AlGaN / GaN HEMTs performances is presented in this paper. The near field setup is used to disturb with electromagnetic field the device under test (DUT). Degradations in DC and power characteristics are observed. They are induced by thermal and trapping process. A relaxation phenomenon was observed after stopping the stress.
Keywords :
III-V semiconductors; aluminium compounds; electromagnetic fields; gallium compounds; high electron mobility transistors; microwave power amplifiers; nitrogen compounds; relaxation; semiconductor device reliability; semiconductor device testing; AlGaN-GaN; DC characteristics; HEMT transistor performance; RF high power amplifier; device under test; electromagnetic field stress impact; microwave frequency; power characteristics; relaxation phenomenon; reliability; thermal process; trapping process; Aluminum gallium nitride; Electromagnetics; Gallium nitride; HEMTs; Probes; Radio frequency; Stress; AlGaN/GaN HEMT; DC characteristic; Electromagnetic field stress; power characteristic;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Conference (GeMIC), 2011 German
Conference_Location :
Darmstadt
Print_ISBN :
978-1-4244-9225-1
Electronic_ISBN :
978-3-9812668-3-2
Type :
conf
Filename :
5760768
Link To Document :
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