• DocumentCode
    544158
  • Title

    Study of electromagnetic field stress impact on AlGaN/GaN HEMT transistor performances

  • Author

    Khémiri, S. ; Kadi, M. ; Louis, A. ; Mazari, B.

  • Author_Institution
    IRSEEM, ESIGELEC Technopole du Madrillet, St. Etienne du Rouvray, France
  • fYear
    2011
  • fDate
    14-16 March 2011
  • Firstpage
    1
  • Lastpage
    4
  • Abstract
    AlGaN/GaN HEMTs are tremendous interest in applications requiring high power at microwave frequencies. In the context of studying the reliability of RF High Power Amplifiers (HPA) in their real environment, a study of the effect of electromagnetic stress on AlGaN / GaN HEMTs performances is presented in this paper. The near field setup is used to disturb with electromagnetic field the device under test (DUT). Degradations in DC and power characteristics are observed. They are induced by thermal and trapping process. A relaxation phenomenon was observed after stopping the stress.
  • Keywords
    III-V semiconductors; aluminium compounds; electromagnetic fields; gallium compounds; high electron mobility transistors; microwave power amplifiers; nitrogen compounds; relaxation; semiconductor device reliability; semiconductor device testing; AlGaN-GaN; DC characteristics; HEMT transistor performance; RF high power amplifier; device under test; electromagnetic field stress impact; microwave frequency; power characteristics; relaxation phenomenon; reliability; thermal process; trapping process; Aluminum gallium nitride; Electromagnetics; Gallium nitride; HEMTs; Probes; Radio frequency; Stress; AlGaN/GaN HEMT; DC characteristic; Electromagnetic field stress; power characteristic;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Conference (GeMIC), 2011 German
  • Conference_Location
    Darmstadt
  • Print_ISBN
    978-1-4244-9225-1
  • Electronic_ISBN
    978-3-9812668-3-2
  • Type

    conf

  • Filename
    5760768