DocumentCode
54517
Title
Resonant Body Transistors in IBM´s 32 nm SOI CMOS Technology
Author
Marathe, Radhika ; Bahr, Bichoy ; Wentao Wang ; Mahmood, Zohaib ; Daniel, Luca ; Weinstein, D.
Author_Institution
Electr. Eng. & Comput. Sci. Dept., Massachusetts Inst. of Technol., Cambridge, MA, USA
Volume
23
Issue
3
fYear
2014
fDate
Jun-14
Firstpage
636
Lastpage
650
Abstract
This paper presents unreleased CMOS-integrated MEMS resonators fabricated at the transistor level of IBM´s 32SOI technology and realized without the need for any postprocessing or packaging. In this technology, resonant body transistors (RBTs) are driven capacitively and sensed piezoresistively using an n-channel field effect transistor (FET). Acoustic Bragg Reflectors (ABRs) are used to localize acoustic vibrations in the unreleased resonators completely buried under the CMOS metal stack and surrounded by low-κ dielectric. FET sensing is analytically compared with alternative active and passive sensing mechanisms to benchmark CMOS-MEMS resonator performance with frequency scaling. Experimental results from the first generation hybrid CMOS-MEMS RBTs show RBTs operating above 11 GHz with Qs of 24-30 and footprints of 5 × 3 μm. Comparative behavior of devices with design variations is used to demonstrate the effect of ABRs on spurious mode suppression. In addition, the performance of the RBTs is compared with passive electrostatic resonators, which show no discernible peak. Finally, temperature stability of <;3 ppm/K due to complimentary materials in the CMOS stack is analytically and experimentally verified.
Keywords
CMOS integrated circuits; field effect transistors; low-k dielectric thin films; micromechanical resonators; semiconductor device packaging; silicon-on-insulator; ABR; CMOS metal stack; CMOS-MEMS resonator; FET sensing; IBM SOI CMOS technology; Si; acoustic Bragg reflectors; acoustic vibrations; active sensing; frequency scaling; low-κ dielectric; n-channel field effect transistor; packaging; passive electrostatic resonators; passive sensing; resonant body transistors; size 32 nm; spurious mode suppression; temperature stability; transistor level; unreleased CMOS-integrated MEMS resonators; Acoustics; CMOS integrated circuits; Field effect transistors; Materials; Noise; Resonant frequency; Sensors; CMOS-MEMS; RF MEMS; Resonator; resonant body transistor; resonant body transistor.;
fLanguage
English
Journal_Title
Microelectromechanical Systems, Journal of
Publisher
ieee
ISSN
1057-7157
Type
jour
DOI
10.1109/JMEMS.2013.2283720
Filename
6634199
Link To Document