An effective calculation method for conformal array mounted on curved-surface platform

An effective approach for calculating the far field pattern of conformal arrays mounted on curved-surface platform is proposed. Starting from the superposition principle for arrays, an active element pattern technique including element mutual coupling effects is used to illuminate the radiation characteristics of arrays. A coordinate transform is applied to create polarization quantities, and a general process for the element polarized pattern transformation is performed. And then an active element pattern technique combining with the element polarized pattern transformation are applied to analyze a curved-surface conformal array, which divides a large array analysis problem as a superposition of various simplified small array problems and greatly reduces the computation burden. Numerical results show the proposed method is valid.