Nanoscale multilayers as optical elements for X-ray photolitography

Author

Radic, N. ; Salamon, K. ; Dubcek, P. ; Milat, O. ; Jercinovic, M. ; Drazic, G. ; Bernstorff, S.

Author_Institution

Ruder Boskovic Inst., Zagreb, Croatia

fYear

2011

fDate

23-27 May 2011

Firstpage

27

Lastpage

30

Abstract

The development of ever smaller electronic components by using a photolithographic process is limited by the wavelength of light. For the EUV and X-ray ranges the artificial multilayer coatings in the nanometer range are used as optical elements. From the viewpoint of both technology and optical properties, the tungsten/carbon combination is one of the best for X-ray radiation. In this work we have examined the effects of periodicity, tungsten phase composition, and number of W/C bilayers upon the reflectivity of hard X-rays. The W/C multilayers have been prepared by sequential RF/DC magnetron sputtering and characterized by GISAXS, TEM, and X-ray reflectivity methods.

Keywords

X-ray spectra; carbon; coatings; optical elements; optical multilayers; photolithography; sputter deposition; transmission electron microscopy; tungsten; ultraviolet spectra; EUV ranges; GISAXS; RF/DC magnetron sputtering; TEM; W-C; W/C bilayers; X-ray photolitography; X-ray radiation; X-ray ranges; X-ray reflectivity; artificial multilayer coatings; electronic components; hard X-rays; nanoscale multilayers; optical elements; periodicity effects; photolithographic process; tungsten phase composition; tungsten/carbon combination; Carbon; Correlation; Nonhomogeneous media; Reflectivity; Rough surfaces; Surface roughness; Tungsten;

fLanguage

English

Publisher

ieee

Conference_Titel

MIPRO, 2011 Proceedings of the 34th International Convention

Conference_Location

Opatija

Print_ISBN

978-1-4577-0996-8

Type

conf

Filename

5967017