DocumentCode
549376
Title
Nanoimprint lithography for photonic devices
Author
Niemi, Tapio
Author_Institution
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
fYear
2011
fDate
22-26 May 2011
Firstpage
1
Lastpage
4
Abstract
Photonic devices, especially nanostructured components, play a key role in the integration of photonic devices and advanced applications. Cost and processing time are some of the bottlenecks of present nanolithography in the mass production of various structures and devices. Nanoimprint lithography is one of the candidates to reduce the cost and replication time. This presentation summarizes various devices we have realized by utilizing nanoimprint lithography for nanopatterning compound semiconductors and metals.
Keywords
integrated optics; nanofabrication; nanolithography; nanopatterning; nanophotonics; optical fabrication; photolithography; soft lithography; compound semiconductors; metals; nanoimprint lithography; nanopatterning; photonic devices; Gratings; Nanolithography; Optical device fabrication; Optical waveguides; Photonics; Substrates; Waveguide lasers;
fLanguage
English
Publisher
ieee
Conference_Titel
Compound Semiconductor Week (CSW/IPRM), 2011 and 23rd International Conference on Indium Phosphide and Related Materials
Conference_Location
Berlin
Print_ISBN
978-1-4577-1753-6
Electronic_ISBN
978-3-8007-3356-9
Type
conf
Filename
5978380
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