DocumentCode
549486
Title
Improved post-silicon power modeling using AC lock-in techniques
Author
Nowroz, A. ; Woods, Grant ; Reda, Sherief
Author_Institution
Sch. of Eng., Brown Univ., Providence, RI, USA
fYear
2011
fDate
5-9 June 2011
Firstpage
101
Lastpage
107
Abstract
The objective of power modeling is to estimate the power consumption of integrated circuits under different workloads and variabilities. Post-silicon power modeling is an essential step for design validation and for building trustable pre-silicon power models and analyses. One popular approach for devising post-silicon power estimates is to translate the thermal emissions from the backside of the die into power estimates. Such approach faces a major physical challenge arising from spatial heat diffusion which blurs the resultant thermal images. The objective of this paper is to improve post-silicon power mapping by utilizing lock-in thermography techniques where AC signals, rather than DC signals, are used to excite the circuit blocks. We prove and demonstrate that using AC excitation sources reduces the extent of spatial heat diffusion. We devise a lock-in based thermal to power inversion methodology that maps spatial power consumption on a real chip. Using a custom test chip, we are to able to scientifically quantify and validate the improvements in power mapping attained from the proposed techniques. We show that our technique reduces the power mapping errors by more than half.
Keywords
infrared imaging; integrated circuit design; integrated circuit modelling; logic CAD; thermal management (packaging); AC excitation sources; AC lock-in techniques; IC design process; circuit blocks; custom test chip; design validation; lock-in based thermal; lock-in thermography techniques; post-silicon power modeling; power consumption estimation; power inversion methodology; power mapping error reduction; pre-silicon power analyses; pre-silicon power models; resultant thermal images; spatial heat diffusion; spatial power consumption; thermal emissions; Power characterization; thermal infrared emissions;
fLanguage
English
Publisher
ieee
Conference_Titel
Design Automation Conference (DAC), 2011 48th ACM/EDAC/IEEE
Conference_Location
New York, NY
ISSN
0738-100x
Print_ISBN
978-1-4503-0636-2
Type
conf
Filename
5981706
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