Title :
Phase transformation kinetics of HfO2 polymorphs in ultra-thin region
Author :
Nakajima, Y. ; Kita, K. ; Nishimura, T. ; Nagashio, K. ; Toriumi, A.
Author_Institution :
Dept. of Mater. Eng., Univ. of Tokyo, Tokyo, Japan
Abstract :
Thermodynamically non-equilibrium phase transformation in ultra thin HfO2 films was investigated. Amorphous HfO2 is crystallized into stable monoclinic phase via metastable cubic one. It was also demonstrated that the k-value of cubic-HfO2 was ~50. Kinetic analysis according to Mehl-Avrami-Johnson law pointed out the cubic-HfO2 is stable for practical use thanks to the suppression of monoclinic nucleus formation.
Keywords :
amorphous state; hafnium compounds; high-k dielectric thin films; nonequilibrium thermodynamics; polymorphic transformations; HfO2; Mehl-Avrami-Johnson law; amorphous ultrathin films; high-k dielectrics; polymorphs; stable monoclinic phase; thermodynamic nonequilibrium phase transformation kinetics; Annealing; Films; Hafnium compounds; Kinetic theory; Silicon; Very large scale integration; X-ray scattering; Cubic; HfO2; Higher-k; Kinetics and Mehl-Avrami-Johnson law; Martensite; Phase transformation;
Conference_Titel :
VLSI Technology (VLSIT), 2011 Symposium on
Conference_Location :
Honolulu, HI
Print_ISBN :
978-1-4244-9949-6
