DocumentCode :
549679
Title :
Critical discussion on (100) and (110) orientation dependent transport: nMOS planar and FinFET
Author :
Young, C.D. ; Baykan, M.O. ; Agrawal, A. ; Madan, H. ; Akarvardar, K. ; Hobbs, C. ; Ok, I. ; Taylor, W. ; Smith, C.E. ; Hussain, M.M. ; Nishida, T. ; Thompson, S. ; Majhi, P. ; Kirsch, P. ; Datta, S. ; Jammy, R.
Author_Institution :
SEMATECH, Albany, NY, USA
fYear :
2011
fDate :
14-16 June 2011
Firstpage :
18
Lastpage :
19
Abstract :
Electron mobility on (100) and (110) planar FETs and SOI FinFETs was evaluated. It is experimentally demonstrated that the (110) sidewall of FinFETs does not present a drawback in terms of electron mobility - contrary to results obtained on (110) planar MOSFETs. This is comprehensively explained by a combination of first principles and empirical approach closely matching the experimental data.
Keywords :
MOSFET; electron mobility; SOI FinFET; electron mobility; orientation dependent transport; planar MOSFET; Electron mobility; FinFETs; Logic gates; Phonons; Scattering; Strontium;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
VLSI Technology (VLSIT), 2011 Symposium on
Conference_Location :
Honolulu, HI
ISSN :
0743-1562
Print_ISBN :
978-1-4244-9949-6
Type :
conf
Filename :
5984612
Link To Document :
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