Title :
A Fully Functional 64 Mb DDR3 ST-MRAM Built on 90 nm CMOS Technology
Author :
Rizzo, N.D. ; Houssameddine, Dimitri ; Janesky, J. ; Whig, R. ; Mancoff, F.B. ; Schneider, M.L. ; DeHerrera, M. ; Sun, J.J. ; Nagel, K. ; Deshpande, S. ; Chia, H.-J. ; Alam, Syed M. ; Andre, Torsten ; Aggarwal, Suhas ; Slaughter, J.M.
Author_Institution :
Everspin Technol., Chandler, AZ, USA
Abstract :
A spin torque magnetoresistive random access memory (ST-MRAM) holds great promise to be a fast, high density, nonvolatile memory that can enhance the performance of a variety of applications, particularly when used as a non-volatile buffer in data storage devices and systems. Towards that end, we have developed a fully functional 64 Mb DDR3 ST-MRAM built on 90 nm CMOS technology. The memory is organized in an 8-bank configuration that can sustain 1.6 GigaTransfers/s (DDR3-1600). We have run standard memory tests, such as a March6N pattern, on the full 64 Mb at 800 MHz with 0 fails for greater than 10 5 cycles. Full functionality was also verified from 0°C to 70°C with no significant change in performance. The bits are magnetic tunnel junctions (MTJs) having an MgO tunnel barrier and a magnetic free layer made of a CoFeB-based alloy with an in-plane magnetization, but with an out-of-plane anisotropy reduced by more than 50% due to an enhanced perpendicular surface anisotropy. To enable the 64 Mb performance, we developed an MTJ stack that has low switching voltage (Vsw), high breakdown voltage (Vbd), and excellent switching reliability with tight distributions. The ST switching distribution has σ ≈ 10%, and we found excellent agreement with a single Gaussian distribution down to an error rate . For our optimized material, the Vsw/Vbd ≈ 0.3, and the separation between Vsw and Vbd is ≈ 25σ. The energy barrier to magnetization reversal (Eb) was characterized using both time-dependent coercivity and higher temperature to accelerate reversal. We found the average Eb ≈ 70kbT.
Keywords :
CMOS memory circuits; MRAM devices; coercive force; magnesium compounds; magnetic switching; magnetic tunnelling; magnetisation reversal; perpendicular magnetic anisotropy; reliability; 8-bank configuration; CMOS technology; DDR3-1600; Gaussian distribution; MTJ stack; March6N pattern; MgO; breakdown voltage; energy barrier; error rate; frequency 800 MHz; fully functional DDR3 ST-MRAM; high density nonvolatile memory; in-plane magnetization; magnetic free layer; magnetic tunnel junctions; magnetization reversal; out-of-plane anisotropy; perpendicular surface anisotropy; size 90 nm; spin torque magnetoresistive random access memory; standard memory tests; switching distribution; switching reliability; switching voltage; temperature 0 degC to 70 degC; time-dependent coercivity; tunnel barrier; Anisotropic magnetoresistance; CMOS integrated circuits; Magnetic resonance; Magnetic tunneling; Noise; Switches; Torque; Magnetic memory; magnetic tunnel junction; magnetoresistive random access memory (ST-MRAM); spin torque;
Journal_Title :
Magnetics, IEEE Transactions on
DOI :
10.1109/TMAG.2013.2243133