• DocumentCode
    55088
  • Title

    Analytical and Finite-Element Modeling of a Two-Contact Circular Test Structure for Specific Contact Resistivity

  • Author

    Pan, Yongping ; Reeves, Geoffrey K. ; Leech, Patrick W. ; Holland, Anthony S.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., R. Melbourne Inst. of Technol., Melbourne, VIC, Australia
  • Volume
    60
  • Issue
    3
  • fYear
    2013
  • fDate
    Mar-13
  • Firstpage
    1202
  • Lastpage
    1207
  • Abstract
    The specific contact resistivity of a metal-semiconductor ohmic contact can be determined using a number of different test structures, and several of these use the transmission line model approach. In the circular transmission line model test structure, the concentric circular contacts have circular equipotentials in the semiconductor layer, and transmission line model equations can be used to describe their current-voltage behavior. Using test structures with two circular contacts of three different sizes, we present a new technique for determining specific contact resistivity. The analytical expressions are developed and presented, and finite-element modeling results are undertaken to demonstrate the accuracy of the technique. The scaling behavior of this test structure is also discussed. There are no error corrections required for determining contact parameters using the presented test structure.
  • Keywords
    contact resistance; finite element analysis; ohmic contacts; semiconductor-metal boundaries; transmission line theory; circular equipotentials; circular-transmission line model test structure; concentric circular contacts; current-voltage behavior; finite element modeling; metal-semiconductor ohmic contact; scaling behavior; semiconductor layer; specific contact resistivity; transmission line model equation; two-contact circular test structure; Conductivity; Contact resistance; Electrodes; Finite element methods; Ohmic contacts; Resistance; Semiconductor device modeling; Contact resistance; ohmic contact; specific contact resistivity;
  • fLanguage
    English
  • Journal_Title
    Electron Devices, IEEE Transactions on
  • Publisher
    ieee
  • ISSN
    0018-9383
  • Type

    jour

  • DOI
    10.1109/TED.2013.2242076
  • Filename
    6461397