Title :
Growth of Co thin films by magnetron sputtering method and its performance analysis
Author :
Yuan, Min ; Pu, Li-Chun ; Feng, Wen-Lin ; Chen, Peng
Author_Institution :
Sch. of Photoelectric Inf., Chongqing Univ. of Technol., Chongqing, China
Abstract :
In the present paper, the Co film has been prepared successfully by magnetron sputtering method. The thin film character of surface, the structure characteristic and magnetism characteristic have been analyzed. The results have been analyzed and discussed.
Keywords :
cobalt; ferromagnetic materials; magnetic hysteresis; magnetic thin films; metallic thin films; sputter deposition; surface structure; Co; cobalt thin films; ferromagnetic materials; magnetic hysteresis loops; magnetism; magnetron sputtering; surface structure; Magnetic films; Magnetic properties; Magnetization; Presses; Saturation magnetization; Sputtering; Co thin films; Magnetron sputtering method; performance analysis;
Conference_Titel :
Electronics and Optoelectronics (ICEOE), 2011 International Conference on
Conference_Location :
Dalian
Print_ISBN :
978-1-61284-275-2
DOI :
10.1109/ICEOE.2011.6013252
