Title :
Enhanced surface antireflection by sharpening vertically aligned silicon nanowires
Author :
Wu, Kai-Chung ; Hung, Yung-Jr ; Lee, San-Liang ; Pan, Yen-Ting
Author_Institution :
Dept. of Electron. Eng., Nat. Taiwan Univ. of Sci. & Technol., Taipei, Taiwan
Abstract :
Enhanced antireflection by sharpening vertically aligned silicon nanowires (SiNWs) is demonstrated with simple fabrication procedures over a large area. Enough light trapping and ~92% solar weighted absorption can be achieved with very short SiNWs.
Keywords :
elemental semiconductors; nanowires; reflectivity; silicon; surface treatment; Si; enhanced surface antireflection; light trapping; simple fabrication procedures; solar weighted absorption; vertically aligned silicon nanowires; Etching; Silicon;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-288-2
Electronic_ISBN :
978-986-02-8974-9
