DocumentCode
552151
Title
Phenolic additives and their effects on blend morphologies of bulk heterojunctions
Author
Wang, Po-Hsun ; Gong, Fang-Lin ; Huang, Wen-Yao
Author_Institution
Inst. of Electro-Opt. Eng., Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
fYear
2011
fDate
4-8 July 2011
Firstpage
500
Lastpage
501
Abstract
In this study, attempts to add the BPS additives in the active layer. And observed by the XRD, additives will affect the arrangement of the rules of P3HT, leading to increase efficiency.
Keywords
X-ray diffraction; polymers; P3HT; XRD; blend morphology; bulk heterojunctions; phenolic additives; poly(3-hexylthiophene); Additives; Electrodes; Photovoltaic cells; Resistance; Substrates; X-ray scattering;
fLanguage
English
Publisher
ieee
Conference_Titel
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-288-2
Electronic_ISBN
978-986-02-8974-9
Type
conf
Filename
6015231
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