Title :
Phenolic additives and their effects on blend morphologies of bulk heterojunctions
Author :
Wang, Po-Hsun ; Gong, Fang-Lin ; Huang, Wen-Yao
Author_Institution :
Inst. of Electro-Opt. Eng., Nat. Sun Yat-sen Univ., Kaohsiung, Taiwan
Abstract :
In this study, attempts to add the BPS additives in the active layer. And observed by the XRD, additives will affect the arrangement of the rules of P3HT, leading to increase efficiency.
Keywords :
X-ray diffraction; polymers; P3HT; XRD; blend morphology; bulk heterojunctions; phenolic additives; poly(3-hexylthiophene); Additives; Electrodes; Photovoltaic cells; Resistance; Substrates; X-ray scattering;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-288-2
Electronic_ISBN :
978-986-02-8974-9
