DocumentCode
552250
Title
Comparison between the silicon microrings fabricated by Gaussian and variable shape electron beam lithography
Author
Zeng, Zhi-Wei ; Yang, Tsung Han ; Lee, Yao-Jen ; Chen, Yung Jui ; Chao, Shiuh
Author_Institution
Inst. of Photonics Technol., Nat. Tsing Hua Univ., Hsinchu, Taiwan
fYear
2011
fDate
4-8 July 2011
Firstpage
703
Lastpage
704
Abstract
We report the morphological quality of microring filters fabricated by Gaussian and variable shaped electron beam lithography methods. The former yields smoother sidewall and better coupling coefficient control.
Keywords
electron beam lithography; integrated optics; micro-optomechanical devices; optical fabrication; optical filters; optical resonators; Gaussian shape electron beam lithography; Si; coupling coefficient control; microring filter; morphological quality; smooth sidewall; variable shape electron beam lithography; Fabrication;
fLanguage
English
Publisher
ieee
Conference_Titel
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location
Kaohsiung
Print_ISBN
978-1-61284-288-2
Electronic_ISBN
978-986-02-8974-9
Type
conf
Filename
6015333
Link To Document