Title :
Comparison between the silicon microrings fabricated by Gaussian and variable shape electron beam lithography
Author :
Zeng, Zhi-Wei ; Yang, Tsung Han ; Lee, Yao-Jen ; Chen, Yung Jui ; Chao, Shiuh
Author_Institution :
Inst. of Photonics Technol., Nat. Tsing Hua Univ., Hsinchu, Taiwan
Abstract :
We report the morphological quality of microring filters fabricated by Gaussian and variable shaped electron beam lithography methods. The former yields smoother sidewall and better coupling coefficient control.
Keywords :
electron beam lithography; integrated optics; micro-optomechanical devices; optical fabrication; optical filters; optical resonators; Gaussian shape electron beam lithography; Si; coupling coefficient control; microring filter; morphological quality; smooth sidewall; variable shape electron beam lithography; Fabrication;
Conference_Titel :
Opto-Electronics and Communications Conference (OECC), 2011 16th
Conference_Location :
Kaohsiung
Print_ISBN :
978-1-61284-288-2
Electronic_ISBN :
978-986-02-8974-9
