DocumentCode :
555377
Title :
Topic-based defect prediction: NIER track
Author :
Nguyen, Tung Thanh ; Nguyen, Tien N. ; Phuong, Tu Minh
Author_Institution :
Electr. & Comput. Eng. Dept., Iowa State Univ., Des Moines, IA, USA
fYear :
2011
fDate :
21-28 May 2011
Firstpage :
932
Lastpage :
935
Abstract :
Defects are unavoidable in software development and fixing them is costly and resource-intensive. To build defect prediction models, researchers have investigated a number of factors related to the defect-proneness of source code, such as code complexity, change complexity, or socio-technical factors. In this paper, we propose a new approach that emphasizes on technical concerns/functionality of a system. In our approach, a software system is viewed as a collection of software artifacts that describe different technical concerns/-aspects. Those concerns are assumed to have different levels of defect-proneness, thus, cause different levels of defectproneness to the relevant software artifacts. We use topic modeling to measure the concerns in source code, and use them as the input for machine learning-based defect prediction models. Preliminary result on Eclipse JDT shows that the topic-based metrics have high correlation to the number of bugs (defect-proneness), and our topic-based defect prediction has better predictive performance than existing state-of-the-art approaches.
Keywords :
communication complexity; learning (artificial intelligence); program diagnostics; software cost estimation; software metrics; software reliability; source coding; Eclipse JDT; NIER Track; change complexity; code complexity; machine learning-based defect prediction model; socio-technical factor; software artifacts; software development; source code defect-proneness; topic-based defect prediction model; topic-based metrics; Complexity theory; Computer bugs; Correlation; Measurement; Predictive models; Semantics; Software; defect prediction; topic modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Software Engineering (ICSE), 2011 33rd International Conference on
Conference_Location :
Honolulu, HI
ISSN :
0270-5257
Print_ISBN :
978-1-4503-0445-0
Electronic_ISBN :
0270-5257
Type :
conf
DOI :
10.1145/1985793.1985950
Filename :
6032555
Link To Document :
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