• DocumentCode
    556809
  • Title

    In-line metrology monitoring through the diagnostic of EQ-to-EQ variations

  • Author

    Chan, Ya-chuan

  • Author_Institution
    Quality Planning & Control Department
  • fYear
    2011
  • fDate
    5-6 Sept. 2011
  • Firstpage
    1
  • Lastpage
    19
  • Abstract
    A collection of slides from the author´s conference presentation about the in line metrology monitoring through the diagnostic of EQ-to-EQ variations is presented.
  • Keywords
    semiconductor device manufacture; semiconductor device testing; EQ to EQ variations; diagnostic; inline metrology monitoring; Data models; Load modeling; Loading; Metrology; Monitoring; Planning; Real time systems;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-1647-8
  • Type

    conf

  • Filename
    6086036
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=556809