Title :
In-line metrology monitoring through the diagnostic of EQ-to-EQ variations
Author_Institution :
Quality Planning & Control Department
Abstract :
A collection of slides from the author´s conference presentation about the in line metrology monitoring through the diagnostic of EQ-to-EQ variations is presented.
Keywords :
semiconductor device manufacture; semiconductor device testing; EQ to EQ variations; diagnostic; inline metrology monitoring; Data models; Load modeling; Loading; Metrology; Monitoring; Planning; Real time systems;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
