• DocumentCode
    556825
  • Title

    Avoiding low flow conditions for filters used in wet cleaning processes

  • Author

    Hashimoto, Masatoshi ; Tsuzuki, Shuichi ; Numaguchi, Toru ; Miyazaki, Namio

  • fYear
    2011
  • fDate
    5-6 Sept. 2011
  • Firstpage
    1
  • Lastpage
    10
  • Abstract
    We report on a key factor that can increase the dewetting risk and demonstrate how using Molecular Surface Tailoring technology (MST) decreases the risk of dewetting.
  • Keywords
    cleaning; filters; semiconductor device manufacture; surface treatment; dewetting risk; filters; low flow conditions; molecular surface tailoring technology; wet cleaning processes; Chemicals; Cleaning; Collaboration; Joints; Laboratories; Manufacturing; Production facilities;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-1647-8
  • Type

    conf

  • Filename
    6086052
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=556825