Title :
Metal grain suppression and DOI capture rate improvement in 32 nm technology node
Author :
Li, Hsiao-Leng ; Hung, Che-Lung ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan
Abstract :
A collection of slides from the author´s conference presentation about the metal grain suppression and DOI capture rate improvement in 32 nm technology node is presented.
Keywords :
semiconductor device manufacture; semiconductor technology; DOI capture rate improvement; metal grain suppression; technology node; wavelength 32 nm; Broadband communication; Inspection; Light sources; Optical filters; Sensitivity; Tuning;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
