• DocumentCode
    556839
  • Title

    Metal grain suppression and DOI capture rate improvement in 32 nm technology node

  • Author

    Li, Hsiao-Leng ; Hung, Che-Lung ; Luoh, Tuung ; Yang, Ling-Wu ; Yang, Tahone ; Chen, Kuang-Chao ; Lu, Chih-Yuan

  • fYear
    2011
  • fDate
    5-6 Sept. 2011
  • Firstpage
    1
  • Lastpage
    15
  • Abstract
    A collection of slides from the author´s conference presentation about the metal grain suppression and DOI capture rate improvement in 32 nm technology node is presented.
  • Keywords
    semiconductor device manufacture; semiconductor technology; DOI capture rate improvement; metal grain suppression; technology node; wavelength 32 nm; Broadband communication; Inspection; Light sources; Optical filters; Sensitivity; Tuning;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
  • Conference_Location
    Hsinchu
  • ISSN
    1523-553X
  • Print_ISBN
    978-1-4577-1647-8
  • Type

    conf

  • Filename
    6086066
    • Link To Document
    https://search.isc.ac/dl/search/defaultta.aspx?DTC=49&DC=556839