Title :
A Rosebrock´s diagonal dominance study on multiple resolution APC
Abstract :
A collection of slides from the Andy Tsen´s conference presentation about a Rosebrock´s diagonal dominance study on multiple resolution APC is presented.
Keywords :
chemical mechanical polishing; semiconductor device manufacture; semiconductor industry; CMP; Rosebrock; diagonal dominance study; multiple resolution APC; Equations; Indexes; Mathematical model; Metrology; Signal resolution; Stability criteria;
Conference_Titel :
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location :
Hsinchu
Print_ISBN :
978-1-4577-1647-8
