DocumentCode
556851
Title
Defect management with reticle-to-wafer correlations
Author
Hsu, Wen-Hao ; Gau, Yeu-Dong ; Tseng, David ; Yong, Poh-Boon
fYear
2011
fDate
5-6 Sept. 2011
Firstpage
1
Lastpage
22
Abstract
A collection of slides from the Andy Tsen´s conference presentation about a Rosebrock´s diagonal dominance study on multiple resolution APC is presented.
Keywords
crystal defects; reticles; semiconductor device manufacture; semiconductor industry; defect management; reticle to wafer correlations; Collaboration; Complexity theory; Inspection; Joints; Manufacturing; Monitoring; Repeaters;
fLanguage
English
Publisher
ieee
Conference_Titel
Semiconductor Manufacturing (ISSM) and e-Manufacturing and Design Collaboration Symposium (eMDC), 2011 International Symposium on
Conference_Location
Hsinchu
ISSN
1523-553X
Print_ISBN
978-1-4577-1647-8
Type
conf
Filename
6086078
Link To Document