Title :
Over-exposure image correction with automatic texture synthesis
Author :
Shen, Yehu ; Mo, Rui ; Zhu, Yi ; Wei, Lei ; Gao, Wei ; Peng, Zhenyun
Author_Institution :
Dept. of Syst. Integration & IC Design, Suzhou Inst. of Nano-tech & Nano-bionics, Suzhou, China
Abstract :
A novel over-exposure image correction algorithm combining synthesized texture information in over-exposed regions is presented. In this algorithm, intensity image is decomposed into structure and detail layers by weighted least squares method. Modified exemplar-based texture synthesis method is applied to the detail layer in order to synthesize texture details in over-exposed regions. The synthesized texture is combined with the original texture and fed to the lightness and color correction modules to get the final result. An efficient diffusion-like color correction method is presented. Qualitative and quantitative experimental results show that the proposed method produces vivid details which are absent in previous methods without human assistance in over-exposed regions. This improves the overall appearance of the recovered image.
Keywords :
image colour analysis; image enhancement; image restoration; image texture; least squares approximations; automatic texture synthesis; color correction module; diffusion-like color correction method; image enhancement; image recovery; image restoration; intensity image decomposition; lightness correction module; modified exemplar-based texture synthesis method; over-exposure image correction; weighted least squares method; Algorithm design and analysis; Dynamic range; Equations; Graphics; Image color analysis; Image reconstruction; Mathematical model; image enhancement; image restoration; overexposure correction;
Conference_Titel :
Image and Signal Processing (CISP), 2011 4th International Congress on
Conference_Location :
Shanghai
Print_ISBN :
978-1-4244-9304-3
DOI :
10.1109/CISP.2011.6100306