DocumentCode
55840
Title
Lithium Electrochemical and Electrochromic Properties of Atmospheric Pressure Plasma Jet-Synthesized Tungsten/Molybdenum Mixed Oxide Films for Flexible Electrochromic Devices
Author
Yung-Sen Lin ; Tsung-Hsien Tsai ; Wei-Hau Lu
Author_Institution
Dept. of Chem. Eng., Feng Chia Univ., Taichung, Taiwan
Volume
42
Issue
12
fYear
2014
fDate
Dec. 2014
Firstpage
3772
Lastpage
3785
Abstract
Lithium electrochemical and electrochromic (EC) performances of flexible tungsten/molybdenum mixed oxide (WMoxOyCz) films, deposited onto 40-Ω/square flexible polyethylene terephthalate/indium tin oxide substrates at room temperature (~23°C) and at the short exposed durations of 19-26 s using an atmospheric-pressure plasma-enhanced chemical vapor deposition with an atmospheric pressure plasma jet (APPJ) at various precursor injection angles, are investigated. The flexible organo-tungsten-molybdenum oxide (WMoxOyCz) films have been identified for the remarkable EC performance for 200 cycles of reversible Li+ ion intercalation and deintercalation in a 1-M LiClO4-propylene carbonate electrolyte by a potential sweep switching measurement between -1 and 1 V at a scan rate of 50 mV/s, even after being bent 360° around a 2.5-cm diameter rod for 1000 cycles. The optical modulation (AT) is up to of 75.6% at a wavelength of 691.9 nm for WMoxOyCz films cosynthesized with an APPJ.
Keywords
electrochemistry; electrochromism; electrolytes; lithium; molybdenum compounds; optical modulation; plasma CVD; plasma jets; thin films; tungsten compounds; Li; WMoxOyCz; atmospheric pressure plasma jet; atmospheric-pressure plasma-enhanced chemical vapor deposition; electrochemical properties; electrochromic properties; electrolyte; flexible electrochromic devices; flexible organo-tungsten-molybdenum oxide films; flexible polyethylene terephthalate-indium tin oxide substrates; injection angles; lithium ion deintercalation; lithium ion intercalation; optical modulation; potential sweep switching measurement; pressure 1 atm; scan rate; temperature 293 K to 298 K; time 19 s to 26 s; Indium tin oxide; Plasmas; Positron emission tomography; Substrates; Surface morphology; Surface treatment; Tungsten; Atmospheric pressure plasma; electrochromic (EC) films; molybdenum oxide; plasma-enhanced chemical vapor deposition (PECVD); tungsten oxide;
fLanguage
English
Journal_Title
Plasma Science, IEEE Transactions on
Publisher
ieee
ISSN
0093-3813
Type
jour
DOI
10.1109/TPS.2014.2348016
Filename
6891391
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