DocumentCode :
558573
Title :
Bias and frequency dispersion of dynamic I-V characteristics in microwave transistors
Author :
Avolio, G. ; Schreurs, D. ; Nauwelaers, B. ; Raffo, A. ; Vannini, G. ; Crupi, G.
Author_Institution :
Dept. Electr. Eng., Katholieke Univ. Leuven, Heverlee, Belgium
fYear :
2011
fDate :
10-11 Oct. 2011
Firstpage :
93
Lastpage :
96
Abstract :
This work presents an experimental study of the low-frequency dispersion which impairs the performance of microwave active solid state devices. By exploiting low-frequency large-signal excitations (<; 10 MHz), the dynamic behaviour of the drain-source current generator is highlighted as function of the operating bias condition and frequency. In order to assess the capability of the proposed investigation technique, several experiments have been carried out on a silicon FinFET, a gallium arsenide pHEMT and a gallium nitride HEMT.
Keywords :
III-V semiconductors; MOSFET; elemental semiconductors; gallium arsenide; high electron mobility transistors; microwave field effect transistors; silicon; wide band gap semiconductors; FinFET; GaAs; GaN; HEMT; Si; bias low-frequency dispersion; drain-source current generator; dynamic I-V characteristic; low-frequency large-signal excitation; microwave active solid state device; microwave transistor; pHEMT; Dispersion; Frequency measurement; Gallium nitride; HEMTs; Microwave circuits; Microwave transistors; dispersion; load-pull; microwave active devices; nonlinear measurements;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave Integrated Circuits Conference (EuMIC), 2011 European
Conference_Location :
Manchester
Print_ISBN :
978-1-61284-236-3
Type :
conf
Filename :
6102895
Link To Document :
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