• DocumentCode
    558573
  • Title

    Bias and frequency dispersion of dynamic I-V characteristics in microwave transistors

  • Author

    Avolio, G. ; Schreurs, D. ; Nauwelaers, B. ; Raffo, A. ; Vannini, G. ; Crupi, G.

  • Author_Institution
    Dept. Electr. Eng., Katholieke Univ. Leuven, Heverlee, Belgium
  • fYear
    2011
  • fDate
    10-11 Oct. 2011
  • Firstpage
    93
  • Lastpage
    96
  • Abstract
    This work presents an experimental study of the low-frequency dispersion which impairs the performance of microwave active solid state devices. By exploiting low-frequency large-signal excitations (<; 10 MHz), the dynamic behaviour of the drain-source current generator is highlighted as function of the operating bias condition and frequency. In order to assess the capability of the proposed investigation technique, several experiments have been carried out on a silicon FinFET, a gallium arsenide pHEMT and a gallium nitride HEMT.
  • Keywords
    III-V semiconductors; MOSFET; elemental semiconductors; gallium arsenide; high electron mobility transistors; microwave field effect transistors; silicon; wide band gap semiconductors; FinFET; GaAs; GaN; HEMT; Si; bias low-frequency dispersion; drain-source current generator; dynamic I-V characteristic; low-frequency large-signal excitation; microwave active solid state device; microwave transistor; pHEMT; Dispersion; Frequency measurement; Gallium nitride; HEMTs; Microwave circuits; Microwave transistors; dispersion; load-pull; microwave active devices; nonlinear measurements;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microwave Integrated Circuits Conference (EuMIC), 2011 European
  • Conference_Location
    Manchester
  • Print_ISBN
    978-1-61284-236-3
  • Type

    conf

  • Filename
    6102895